Fabrication of nanogap electrodes via nano-oxidation mask by scanning probe microscopy nanolithography

Rouhi, J. and Mahmud, S. and Hutagalung, S.D. and Kakooei, S. (2011) Fabrication of nanogap electrodes via nano-oxidation mask by scanning probe microscopy nanolithography. Journal of Micro/Nanolithography, MEMS, and MOEMS, 10 (4). ISSN 19325150

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Abstract

In this study, a simple technique was introduced for the fab-ication of nanogap electrodes by using nano-oxidation scanning probe microscopy lithography with a Cr/Pt coated silicon tip. Silicon electrodes with a gap of sub-31 nm were fabricated successfully by this technique. The current-voltage measurements (I-V) of the electrodes demonstrated excellent insulating characteristics. This technique is simple, controllable, inexpensive, and faster than common methods. The results showed that silicon electrodes have a great potential for the fabrication of single molecule transistors, single electron transistors, and other nanoe ectronic devices. © 2011 Society of Photo-Optical Instrumentation Engineers (SPIE).

Item Type: Article
Additional Information: cited By 35
Uncontrolled Keywords: Fabrication; Scanning probe microscopy, Current-voltage measurements; Nano-oxidation; Nanogap electrodes; Silicon electrode; Silicon tips; Single-molecule transistor, Electrodes
Depositing User: Mr Ahmad Suhairi UTP
Date Deposited: 09 Nov 2023 15:50
Last Modified: 09 Nov 2023 15:50
URI: https://khub.utp.edu.my/scholars/id/eprint/2308

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