Double Exposure Materials: Simulation Study of Feasibility

by Byers, Jeffrey, Lee, Saul, Jen, Kane, Zimmerman, Paul, Turro, Nicholas J., Willson, C. Grant
Published 2007

Materials modeling and development for use in double-exposure lithography applications

by Lee, Saul, Jen, Kane, Willson, C. Grant, Byers, Jeffrey, Zimmerman, Paul, Turro, Nicholas J.
Published 2009

An analysis of double exposure lithography options

by Lee, Saul, Byers, Jeffrey, Jen, Kane, Zimmerman, Paul, Rice, Bryan, Turro, Nicholas J., Willson, C. Grant
Published 2008