TY  - CONF
AV  - none
ID  - scholars8846
TI  - Plantar pressure distribution and gait stability: Normal VS high heel
KW  - Manufacture; Pressure distribution; Robotics; Shoe manufacture
KW  -  Center of pressure; Gait stabilities; High Heels; Lower limb; Mid-foot; Peak pressure; Plantar pressure distributions; Plantar pressures
KW  -  Stability
N1  - cited By 6; Conference of 2nd IEEE International Symposium on Robotics and Manufacturing Automation, ROMA 2016 ; Conference Date: 25 September 2016 Through 27 September 2016; Conference Code:126431
N2  - In this paper, the plantar pressure distribution and the center of pressure movement were studied and gait stability of high heels versus normal heels was observed. A group of ten young female participants without any previous lower limbs injuries were asked to wear shoes of different heel heights, namely, 0cm, 2cm and 4cm and walk at a speed of 3km/hr on a treadmill. The pressure that their body exerts on the ground was recorded and analyzed. A statistical analysis was conducted and observed for the center of pressure (p<0.05), peak pressure (p<0.05) and the gait stability. The center of pressure moved from the heel to toe as heel height was increased and the peak pressure moved to the forefoot region. Tukey post-hoc analysis was performed in order to observe the differences in peak pressure in the forefoot, mid-foot and rear foot region. It was found that as the subjects wore a 4cm heel height shoes, the peak pressure was increased in the rear foot regions of the right foot. This resulted from the fact that they tend to lean on their right foot owing to instability during gait. © 2016 IEEE.
PB  - Institute of Electrical and Electronics Engineers Inc.
SN  - 9781509009282
Y1  - 2017///
A1  - Karia, S.
A1  - Parasuraman, S.
A1  - Khan, M.K.A.A.
A1  - Elamvazuthi, I.
A1  - Debnath, N.
A1  - Ali, S.S.A.
UR  - https://www.scopus.com/inward/record.uri?eid=2-s2.0-85015961909&doi=10.1109%2fROMA.2016.7847822&partnerID=40&md5=f49ad5347328ae60172fc02326ea227b
ER  -