eprintid: 695
rev_number: 2
eprint_status: archive
userid: 1
dir: disk0/00/00/06/95
datestamp: 2023-11-09 15:48:50
lastmod: 2023-11-09 15:48:50
status_changed: 2023-11-09 15:22:58
type: article
metadata_visibility: show
creators_name: YIN, C.-Y.
creators_name: Mohanad, E.-H.
title: Simulation of Liquid Argon Flow along a Nanochannel: Effect of Applied Force
ispublished: pub
keywords: Applied forces; Argon atoms; Argon flow; Average velocity; Equilibrium state; large-scale atomic/molecular massively parallel simulator; Liquid argon; Molecular dynamics simulations; Nano channels; Parallel simulator; Repulsive forces; Scientists and engineers; Steady-state condition; System energy; Three dimensional visualization; Time step; Velocity profiles; visual molecular dynamics, Argon; Dynamics; Liquefied gases; Molecular dynamics; Nanofluidics; Simulators; Three dimensional, Flow simulation
note: cited By 8
abstract: Liquid argon flow along a nanochannel is studied using molecular dynamics (MD) simulation in this work. Large-scale Atomic/Molecular Massively Parallel Simulator (LAMMPS) is used as the MD simulator. The effects of reduced forces at 0.5, 1.0 and 2.0 on argon flow on system energy in the form of system potential energy, pressure and velocity profile are described. Output in the form of three-dimensional visualization of the system at steady-state condition using Visual Molecular Dynamics (VMD) is provided to describe the dynamics of the argon atoms. The equilibrium state is reached after 16000 time steps. The effects on system energy, pressure and velocity profile due to reduced force of 2.0 (F2) are clearly distinguishable from the other two lower forces where sufficiently high net force along the direction of the nanochannel for F2 renders the attractive and repulsive forces between the argon atoms virtually non-existent. A reduced force of 0.5 (F0.5) provides liquid argon flow that approaches Poiseuille (laminar) flow as clearly shown by the n-shaped average velocity profile. The extension of the present MD model to a more practical application affords scientists and engineers a good option for simulation of other nanofluidic dynamics processes. © 2009 Chemical Industry and Engineering Society of China (CIESC) and Chemical Industry Press (CIP).
date: 2009
official_url: https://www.scopus.com/inward/record.uri?eid=2-s2.0-71849120050&doi=10.1016%2fS1004-9541%2808%2960269-4&partnerID=40&md5=ee4bef584b6c7a6e2d57948d75c922c7
id_number: 10.1016/S1004-9541(08)60269-4
full_text_status: none
publication: Chinese Journal of Chemical Engineering
volume: 17
number: 5
pagerange: 734-738
refereed: TRUE
issn: 10049541
citation:   YIN, C.-Y. and Mohanad, E.-H.  (2009) Simulation of Liquid Argon Flow along a Nanochannel: Effect of Applied Force.  Chinese Journal of Chemical Engineering, 17 (5).  pp. 734-738.  ISSN 10049541