TY  - JOUR
N2  - The mutual and individual effects of ambient humidity, applied voltage and tip speed on nanooxide masks fabricated by atomic force microscopy were investigated in a statistical system. A response surface methodology and central composite design were used to determine the optimum conditions for nanooxidation. The effects of simultaneous changes in the three independent variables on the thickness of the nanooxide mask were investigated; each variable was found to significantly contribute to the oxide thickness. The experimental results obtained were fitted to a quadratic equation model by multiple regression analysis of all of the response variables studied. The optimum nanooxidation conditions were found to be an ambient humidity of 63.81, an applied voltage of 7.5V, and a tip speed of 0.20m/s. Application of these conditions resulted in an experimental oxide thickness of 3.14nm, which is in very close agreement with that predicted by the model. Nanogap electrodes fabricated by the proposed method were very smooth and had straight edges, indicating that the technique has a great potential for the fabrication of nanoelectronic devices. © 2012 The Institution of Engineering and Technology.
IS  - 4
KW  - Ambient humidity; Applied voltages; Central composite designs; Independent variables; Multiple regression analysis; Nano-oxidation; Nano-oxides; Nanoelectronic devices; Nanogap electrodes; Optimisations; Optimum conditions; Oxide thickness; Quadratic equations; Response surface methodology; Statistical systems; Straight edge; Tip speed
KW  -  Atomic force microscopy; Regression analysis; Surface properties
KW  -  Fabrication
KW  -  article; atomic force microscopy; controlled study; electric potential; electrode; humidity; independent variable; multiple regression; oxidation; response surface method
ID  - scholars3032
UR  - https://www.scopus.com/inward/record.uri?eid=2-s2.0-84860585800&doi=10.1049%2fmnl.2011.0658&partnerID=40&md5=7753382cbcccb35274136c8ebd8e73ef
A1  - Rouhi, J.
A1  - Mahmud, S.
A1  - Hutagalung, S.D.
A1  - Kakooei, S.
JF  - Micro and Nano Letters
VL  - 7
Y1  - 2012///
N1  - cited By 40
TI  - Optimisation of nanooxide mask fabricated by atomic force microscopy nanolithography: A response surface methodology application
SP  - 325
AV  - none
EP  - 328
SN  - 17500443
ER  -