relation: https://khub.utp.edu.my/scholars/2308/
title: Fabrication of nanogap electrodes via nano-oxidation mask by scanning probe microscopy nanolithography
creator: Rouhi, J.
creator: Mahmud, S.
creator: Hutagalung, S.D.
creator: Kakooei, S.
description: In this study, a simple technique was introduced for the fab-ication of nanogap electrodes by using nano-oxidation scanning probe microscopy lithography with a Cr/Pt coated silicon tip. Silicon electrodes with a gap of sub-31 nm were fabricated successfully by this technique. The current-voltage measurements (I-V) of the electrodes demonstrated excellent insulating characteristics. This technique is simple, controllable, inexpensive, and faster than common methods. The results showed that silicon electrodes have a great potential for the fabrication of single molecule transistors, single electron transistors, and other nanoe ectronic devices. © 2011 Society of Photo-Optical Instrumentation Engineers (SPIE).
publisher: SPIE
date: 2011
type: Article
type: PeerReviewed
identifier:   Rouhi, J. and Mahmud, S. and Hutagalung, S.D. and Kakooei, S.  (2011) Fabrication of nanogap electrodes via nano-oxidation mask by scanning probe microscopy nanolithography.  Journal of Micro/Nanolithography, MEMS, and MOEMS, 10 (4).   ISSN 19325150     
relation: https://www.scopus.com/inward/record.uri?eid=2-s2.0-84860745763&doi=10.1117%2f1.3643480&partnerID=40&md5=360db307ef4fcbbbc72c5c734a1d438a
relation: 10.1117/1.3643480
identifier: 10.1117/1.3643480