relation: https://khub.utp.edu.my/scholars/19466/
title: A Comparative Review of Surface Modification Technique Between Physical Vapor Deposition (PVD) and Plasma Electrolytic Oxidation (PEO) for Biomedical Applications
creator: Ahmed, I.
creator: Ahmad, A.
creator: Abdul-Rani, A.M.
creator: Tasnim, N.
creator: Al-Amin, M.
description: Whether the product is a surgical instrument, an orthopaedic implant or a heart valve, it is crucial to meet the criteria of hygiene, durability and protection that are extremely high.Nevertheless, it is quite unlikely for a metal to fully demonstrate all the desired properties.Recently, researchers have focused on coating bio-friendly materials over these tools in order to achieve desired durability and further ensure their safety and reliability.Among the numerous prevailing coating techniques, Physical Vapor Deposition (PVD) and Plasma Electrolytic Oxidation (PEO) coating techniques attain most of the requirements which are desirable for bioimplants and medical instruments.The aim of this review is to show the constructive comparisons between PVD and PEO coatings based on their tribomechanical properties, corrosion resistance and antibacterial characteristics leading to compatibility in biomedical applications.These coatings have positive effects on the biocompatibility and tribological properties of implant surfaces.These coatings have been characterized by scanning electron microscope (SEM), wear track morphology, potentiodynamic polarization test and antimicrobial tests. © 2023, Institute of Technology PETRONAS Sdn Bhd.
publisher: Springer Science and Business Media Deutschland GmbH
date: 2023
type: Article
type: PeerReviewed
identifier:   Ahmed, I. and Ahmad, A. and Abdul-Rani, A.M. and Tasnim, N. and Al-Amin, M.  (2023) A Comparative Review of Surface Modification Technique Between Physical Vapor Deposition (PVD) and Plasma Electrolytic Oxidation (PEO) for Biomedical Applications.  Lecture Notes in Mechanical Engineering.  pp. 813-829.  ISSN 21954356     
relation: https://www.scopus.com/inward/record.uri?eid=2-s2.0-85140801338&doi=10.1007%2f978-981-19-1939-8_61&partnerID=40&md5=b6bff7cd13617f9ddd2c5394decc8f1a
relation: 10.1007/978-981-19-1939-8₆₁
identifier: 10.1007/978-981-19-1939-8₆₁