eprintid: 19370
rev_number: 2
eprint_status: archive
userid: 1
dir: disk0/00/01/93/70
datestamp: 2024-06-04 14:11:49
lastmod: 2024-06-04 14:11:49
status_changed: 2024-06-04 14:05:34
type: article
metadata_visibility: show
creators_name: Al Hasan, M.
creators_name: Ullah, Z.
creators_name: Nawi, I.
creators_name: Mabrouk, I.B.
title: Fabrication of a large scale metasurface with high resolution and enhanced absorption
ispublished: pub
keywords: Electron beam lithography; Fabrication; Infrared radiation; Light absorption; Optoelectronic devices; Plasmonics; Thermography (imaging), Absorption performance; Electron-beam lithography; Enhanced absorption; High resolution; Large-scales; Metallics; Metasurface; Non-linear optical; Optical functionalities; Plasmonics, Fourier transform infrared spectroscopy
note: cited By 2
abstract: Plasmonic metasurface nanostructures have the potential to enable nonlinear optical functionality in metasurfaces by reducing power operating thresholds and enabling ultra-thin subwavelength devices. However, low absorption caused by resistive losses of unwanted metallic appearance and irregular corners in the fabrication process significantly reduces this promise, leading the metasurface community toward the new approaches to fabricate large area metasurfaces with Electron Beam lithography (EBL). In this article, with controlled proximity effect and high dose exposure rate in EBL setup, large area (2 cm2) metasurfaces are fabricated with high resolution of structure. The effect of absorption resonance in Infrared (LWIR) is experimentally studied through Fourier Transform Infrared Spectroscopy (FTIR). The results signify that the metasurface with high resolution and fine metallic corners outperforms the fabricated prototype with metal residue and non-uniform corners. When compared to conventional EBL, our nanofabrication approach speeds the patterning time by three times. The experimental measurements reveal enhanced absorption performance at 8 µm wavelength. Whereas, the developed metasurface is numerically studied to explain the absorption performance with plasmonic field distributions. This approach could be used in optoelectronic devices involving plasmonic applications, such as biosensing and infrared imaging. © 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement.
date: 2023
official_url: https://www.scopus.com/inward/record.uri?eid=2-s2.0-85147546379&doi=10.1364%2fOME.469973&partnerID=40&md5=3fb070817ed4e5b8678e43c83d2c895e
id_number: 10.1364/OME.469973
full_text_status: none
publication: Optical Materials Express
volume: 13
number: 1
pagerange: 130-141
refereed: TRUE
citation:   Al Hasan, M. and Ullah, Z. and Nawi, I. and Mabrouk, I.B.  (2023) Fabrication of a large scale metasurface with high resolution and enhanced absorption.  Optical Materials Express, 13 (1).  pp. 130-141.