TY  - JOUR
UR  - https://www.scopus.com/inward/record.uri?eid=2-s2.0-85158845755&doi=10.1109%2fACCESS.2023.3269579&partnerID=40&md5=017091d46b60d6c8b5d3a33f2d6f1495
PB  - Institute of Electrical and Electronics Engineers Inc.
SP  - 41546
N1  - cited By 1
A1  - Ullah, Z.
A1  - Nawi, I.M.
A1  - Al-Hasan, M.
A1  - Junaid, M.
A1  - Mabrouk, I.B.
A1  - Rehman, A.
Y1  - 2023///
SN  - 21693536
TI  - Interparticle-Coupled Metasurface for Infrared Plasmonic Absorption
ID  - scholars19302
AV  - none
VL  - 11
JF  - IEEE Access
N2  - Plasmonic metasurfaces operating in the long-wavelength infrared region (LWIR) are primarily employed for bio-sensing and imaging applications. The key factor affecting the capability of LWIR metasurfaces is absorption efficiency, whereas significant advances have been made to attain higher absorption intensities, using metal-insulator-metal (MIM) stack structures, which require a complex nanofabrication process and repetition of the patterning process to develop each layer. This study experimentally demonstrates the integration of metasurfaces with plasmonic resonators. The metasurfaces and plasmonic resonators are developed through electron beam lithography (EBL) on the same plane of the Silicon substrate. The fabricated prototype has broad incident angle stability at a bandwidth of 2μ m with near-perfect absorption at 8μ m resonance wavelength when characterized through the Attenuated Total Reflectance - Fourier Transforms Infrared Spectroscopy (ATR-FTIR) setup. The metasurface device achieves tunable resonance behavior when the incident angles reach up to 70°. The proposed integration of metasurface with plasmonic resonators are well-suited for enhanced biosensing applications with metasurface devices. © 2013 IEEE.
KW  - Electron beams; Fourier transform infrared spectroscopy; Infrared radiation; Metal insulator boundaries; MIM devices; Nanotechnology; Plasmonics; Resonators
KW  -  Electron-beam lithography; Incident angles; Infrared regions; Interparticles; Long-wavelength infrared; Metasurface; Optical characterization; Plasmonic coupling; Plasmonic resonators; Plasmonics
KW  -  Electron beam lithography
EP  - 41555
ER  -