eprintid: 13695
rev_number: 2
eprint_status: archive
userid: 1
dir: disk0/00/01/36/95
datestamp: 2023-11-10 03:28:15
lastmod: 2023-11-10 03:28:15
status_changed: 2023-11-10 01:51:47
type: article
metadata_visibility: show
creators_name: Zulfiqar, M.
creators_name: Sufian, S.
creators_name: Rabat, N.E.
creators_name: Mansor, N.
title: Enhancement of photochemical reaction for phenol degradation via tio2 nanomaterials under h2o2 and fecl3: Mechanism and kinetic modeling
ispublished: pub
note: cited By 0
abstract: The surface and groundwater are being contaminated by the fast development of industries, which disturbing the environment for a living organism. The introduction of an economical and eco-friendly treatment approach for fully degrading such harmful contaminants is highly encouraged. The main objective of this research is to illustrate the influence of two different types of accelerators namely hydrogen peroxide (H2O2) and ferric chloride (FeCl3) for the enhancement of photocatalytic degradation of phenol in aqueous suspension in the presence of commercial TiO2 nanomaterials (Degussa P-25, TiO2). The several photocatalytic degradation processes using dark, direct photolysis (only light), TiO2, H2O2 or FeCl3/light, and H2O2 or FeCl3/TiO2/light in a batch photoreactor were performed. Different doses of H2O2 (0.25-1.0 mL) and FeCl3 (0.5-2.0 mL) were used for maximum phenol degradation. The degradation results revealed that 0.5 mL of H2O2/light/TiO2 and 1.0 mL of Fel3/light/TiO2 showed highest phenol degradation of 95.13 and 92.27 , respectively. The photocatalytic degradation of phenol followed pseudo first order and Type 1 pseudo second order kinetics with the highest values of R2 (more than 0.995). This enhancement of phenol degradation in the presence of H2O2 and FeCl3 was strongly attributed to the formation of free hydroxyl radicals over the TiO2 surface. © Malaysian Journal of Microscopy (2020). All rights reserved.
date: 2020
publisher: Microscopy Society of Malaysia
official_url: https://www.scopus.com/inward/record.uri?eid=2-s2.0-85096978988&partnerID=40&md5=47e557a871324c461d8bd8bff9dd5a27
full_text_status: none
publication: Malaysian Journal of Microscopy
volume: 16
number: 2
pagerange: 89-100
refereed: TRUE
issn: 18237010
citation:   Zulfiqar, M. and Sufian, S. and Rabat, N.E. and Mansor, N.  (2020) Enhancement of photochemical reaction for phenol degradation via tio2 nanomaterials under h2o2 and fecl3: Mechanism and kinetic modeling.  Malaysian Journal of Microscopy, 16 (2).  pp. 89-100.  ISSN 18237010