High-Aspect-Ratio Silicon Nanostructures on N-type Silicon Wafer Using Metal-Assisted Chemical Etching (MACE) Technique Conference Paper

http://dx.doi.org/10.1109/pvsc43889.2021.9518597

authors

Razak, Nurul Huda Abdul
Amin, Nowshad
Kiong, Tiong Sieh
Sopian, Kamaruzzaman
Akhtaruzzaman, Md.

publication date

2021

Digital Object Identifier (DOI)

https://doi.org/10.1109/pvsc43889.2021.9518597